K5: Plasma Asher & Glow Discharge Unit
Quorum Technologies own the Polaron brand, and in early 2006 they also purchased Emitech. Rationalisation of the 3 brands is well under way, but a few Emitech and Polaron instruments are still available and featured on our site. ProSciTech is the sole distributor for these three brands in Australasia, south of Singapore. Some additional data may be available from www.quorumtech.com.
Warranty: Quorum Technologies offer a standard 12 months warranty on all instruments. This can be extended to 3 years by filling in and returning the registration form. Pumps are excluded from the extension.Note: Quorum Technologies have discontinued stand-alone glow discharge units. This feature is now included only in the KSC7620 and the KQ150 series as an optional accessory. We can supply a non-Quorum stand-alone glow discharge system.
The primary application of glow discharge is as a technique for the surface modification, or 'wetting', of newly-evaporated transmission electron microscopy (TEM) carbon support films.
We offer three options. The standard KSC7620 Compact Sputter Coater has a built-in glow discharge function. Alternatively, the KQ150R (rotary-pumped) and KQ150T (turbo-pumped) sputter/carbon coating systems can be fitted with an optional glow discharge attachment.
PLASMA UNIT
Operating Principle: The plasma process is accomplished through the use of a low pressure, RF induced, gaseous discharge. The specimen is loaded into the reaction chamber and the chamber is evacuated to a vacuum pressure of 0.1 2.2 torr. A carrier gas is then introduced into the chamber, raising the chamber pressure to 0.3 1.2 torr, depending on the application.
RF power is applied around the chamber. This excites the carrier gas molecules and dissociates it into chemically active atoms and molecules. The mechanism employed in this process is one of ionization. The combustion products, which are completely dissociated and harmless, are carried away in the gas stream. The unique property of this process is that it occurs at relatively low temperatures without employing toxic chemicals.
PUMPS: The plasma ashers require an appropriate size, two stage mechanical pump. Turbo pumped instruments include the turbo pump, but require a mechanical pump also. ProSciTech supplies mechanical pumps for these instruments or separate pumps for other equipment quite competitively. Inquire for more information.
PLASMA UNIT WITH RF GENERATOR - EMITECH K1050X
The K1050X Plasma Treatment Unit consists of a solid state RF generator and associated tuning circuits, dual process gas flow monitoring needle valve control and full or restricted vent control.
It has a cylindrical chamber with a rack out drawer system for ease of sample loading.
The vacuum system is a dual stage separate rotary vacuum pump or optional turbo pump backed by diaphragm pump.
The rack out drawer system can be exchanged for a vacuum loading port, for special cleaning applications in SEM/TEM.
This usually employs an oxygen/argon mix of gases, the oxygen removing the organic material (hydrocarbons) and the argon giving a surface etching of the sample.
Applications:
Features:
Advantages:
Specification of the K1050X Plasma Unit:
Optional Accessories
K1050X Plasma unit with RF generator inquire
K1050T Plasma unit with RF generator, turbo pump inquire
Operating Principle: The plasma process is accomplished through the use of a low pressure, RF induced, gaseous discharge. The specimen is loaded into the reaction chamber and the chamber is evacuated to a vacuum pressure of 0.1 2.2 torr. A carrier gas is then introduced into the chamber, raising the chamber pressure to 0.3 1.2 torr, depending on the application.
RF power is applied around the chamber. This excites the carrier gas molecules and dissociates it into chemically active atoms and molecules. The mechanism employed in this process is one of ionization. The combustion products, which are completely dissociated and harmless, are carried away in the gas stream. The unique property of this process is that it occurs at relatively low temperatures without employing toxic chemicals.
PUMPS: The plasma ashers require an appropriate size, two stage mechanical pump. Turbo pumped instruments include the turbo pump, but require a mechanical pump also. ProSciTech supplies mechanical pumps for these instruments or separate pumps for other equipment quite competitively. Inquire for more information.PLASMA UNIT WITH RF GENERATOR - EMITECH K1050X
The K1050X Plasma Treatment Unit consists of a solid state RF generator and associated tuning circuits, dual process gas flow monitoring needle valve control and full or restricted vent control.
It has a cylindrical chamber with a rack out drawer system for ease of sample loading.
The vacuum system is a dual stage separate rotary vacuum pump or optional turbo pump backed by diaphragm pump.
The rack out drawer system can be exchanged for a vacuum loading port, for special cleaning applications in SEM/TEM.
This usually employs an oxygen/argon mix of gases, the oxygen removing the organic material (hydrocarbons) and the argon giving a surface etching of the sample.
Applications:
- Asbestos sample preparation
- Microincineration of organic material
- Etching of organic samples for SEM & TEM work
- Removal of Photoresist and electronic component encapsulations
- Surface treatment of plastics
- Cleaning of SEM/TEM sample holders
Features:
- Solid state RF generator and associated tuning circuits
- Fully automatic control
- Rack out drawer
- Dual process gas flow
- Compact bench-top system
Advantages:
- Low temperature ashing process
- Easy to operate
- Easy loading/removal of samples
- Can select a mixture of gases
- Space saving
Specification of the K1050X Plasma Unit:
- Instrument case: 450mm W x 350mm D x 300mm H.
- Barrel work chamber: 'Pyrex' 160mm L x 110mm dia. (Borosilicate Glass as standard.)
- Rack out drawer: Sliding draw assembly with sample holder tray.
- Plasma output: RF power supply - Solid state 150 Watt RF peak, normal operating range 25 to 75 Watt @ 13.56mhz.
- (Note: The frequency used is that allocated by the International Standards CISPR as an allowed 'industrial' frequency.)
- Vacuum gauge: active gauge head with fully operating vacuum range display (ATM to 1x10-5 mbar. Full scale - normal operating vacuum 0.5mbar to1.0mbar)
- Digital timer unit: Displays elapsed time with range select: 99.9Hours. Automatic termination of ashing process.
- Dual gas flow gauges: Dual gas needle valve flow control, selectable for 1 or 2 or both gasses (calibrated 5 to 100cm3/minute Air @ A.T.P.)
- Weight: 25kg.
- Supply: 230Volts 50Hz (5 amp max. including. pump)
- Services: Process gas at nominal 5 psi, (0.33bar)
- Recommended vacuum pump: No. 3 pump (with a synthetic oil 'Fomblin' for oxygen or corrosive process gases.) 2m3/Hr
Optional Accessories
- EK3170 - Diaphragm pump MD1 23 L/M
- Fomblinised rotary pump - see page V4 and K6
- EK3171 - XDS5 Scroll pump (oil free)
K1050X Plasma unit with RF generator inquire
K1050T Plasma unit with RF generator, turbo pump inquire
K1050X
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