Quorum Technologies own the Polaron brand and in early 2006 they also purchased Emitech. ProSciTech is now the sole distributor for these three brands in Australasia, south of Singapore. In time, the instrument range may be rationalised, but at present all competing products of these brands are available and featured on our site. Some additional data may be available from www.quorumtech.com.
Warranty:
Quorum Technologies offer a standard 12 months warranty on all instruments. This can be extended to 3 years by filling in and returning the registration form. Pumps are excluded from the extension.
Click here for Glow Discharge Unit
Click here for Thickness Monitor
Turbo versus diffusion pumped coating systems
High vacuum sputter coaters and vacuum evaporators commonly use an oil diffusion pump or a turbomolecular pump, both are backed by a two-stage rotary vane pump. A turbo pumped system should not be compared with a diffusion pumped system. Turbos are more expensive to purchase, but they require virtually no maintenance, don't allow oil vapour from the backing pump into the working chamber, use much less electric power and require no cooling water. Diffusion pumped systems should be phased out, because they are over their life time more expensive, and most of that expense is in energy. Diffusion pumps are environmentally undesirable.
High vacuum sputter coaters and vacuum evaporators commonly use an oil diffusion pump or a turbomolecular pump, both are backed by a two-stage rotary vane pump. A turbo pumped system should not be compared with a diffusion pumped system. Turbos are more expensive to purchase, but they require virtually no maintenance, don't allow oil vapour from the backing pump into the working chamber, use much less electric power and require no cooling water. Diffusion pumped systems should be phased out, because they are over their life time more expensive, and most of that expense is in energy. Diffusion pumps are environmentally undesirable.
LARGE SAMPLE, HIGH RESOLUTION SPUTTER COATER - EMITECH K675X & K675XD
The K675X is a large chamber (300mm) fully automactic turbo pumped sputter coater that allows complete 200mm (8 inch) wafers can be coated in the K675X Sputtering Coater System. The base system with twin gear rotating sample stage gives a progressive elliptical rotation for even sputtering deposition.
The K675X Coating System employs a triple magnetron target assembly which enhances the efficiency of the Sputtering process using low voltages, giving a thin and fine grain coating.
There are three such target assemblies in the K675X, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profile targets.
The multi-target system is particularly useful in the semi-conductor wafer industry. It has a turbomolecular pump backed by a Rotary Vacuum Pump.
The integrated instrument panel and plug-in electronics maximise 'up-time' and, with user-friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve, which has electromagnetic valve back-up.
The independent Vacuum Pump is controlled by the Instrument throughout the fully automatic coating cycle. It can be used to Sputter Coat targets such as Gold, and also targets that may need pre-cleaning, or the removal of oxide layers, such as Chromium.
A shutter assembly is fitted as standard, which allows a Sputter Cleaning and the Sputter Cycle to be carried out while maintaining the vacuum.
The K675XD version has two independently controlled sputtering heads and enables the deposition of two sequential coating materials without the need to break the vacuum. the K675XD is suitable for the samples up to 150mm (6 inch) in diameter.
Features:
Advantages:
Note:Target thickness
Most targets used are precious metals and usually they are only 0.1 or 0.2mm thick. From April 2007 the K575x and K675x target assemblies have been changed. If targets, like Al or Cr, thicker than 0.3mm are to be used with the new systems, appropriate spacers will be necessary under the dark space shield. Typically, a 1.5mm target will require a spacer ring (Part number A4117193).
Specification of K675X Sputtering Coater System:
Optional Accessories
K675X Large sample, high resolution sputter coater, 203mm ask stock?
K675XD Large sample, high resolution sputter coater, 203mm, dual head ask stock?
The K675X is a large chamber (300mm) fully automactic turbo pumped sputter coater that allows complete 200mm (8 inch) wafers can be coated in the K675X Sputtering Coater System. The base system with twin gear rotating sample stage gives a progressive elliptical rotation for even sputtering deposition.
The K675X Coating System employs a triple magnetron target assembly which enhances the efficiency of the Sputtering process using low voltages, giving a thin and fine grain coating.
There are three such target assemblies in the K675X, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profile targets.
The multi-target system is particularly useful in the semi-conductor wafer industry. It has a turbomolecular pump backed by a Rotary Vacuum Pump.
The integrated instrument panel and plug-in electronics maximise 'up-time' and, with user-friendly designs, ensures satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve, which has electromagnetic valve back-up.
The independent Vacuum Pump is controlled by the Instrument throughout the fully automatic coating cycle. It can be used to Sputter Coat targets such as Gold, and also targets that may need pre-cleaning, or the removal of oxide layers, such as Chromium.
A shutter assembly is fitted as standard, which allows a Sputter Cleaning and the Sputter Cycle to be carried out while maintaining the vacuum.
The K675XD version has two independently controlled sputtering heads and enables the deposition of two sequential coating materials without the need to break the vacuum. the K675XD is suitable for the samples up to 150mm (6 inch) in diameter.
Features:
- Equipped with three sputter targets
- Turbo molecular pumping system
- Fully Automatic Control
- Peltier cooled sputter head
- Fine Coating (Order of 0.5nm Cr Grain Size)
- Special Rotating Stage with full Tilt Facility fitted as standard
- Thin Film Deposition (typically 5nm)
- 300mm Diameter Chamber
- Dual sputter head available as an option - K675XD
Advantages:
- Allows coating of large samples such as 8” wafers
- Allows sputtering of fine grain Ir and the fine grain oxidising metal Cr
- Easy to operate
- No cooling water required
- Ultra high resolution reproducible coatings
- Fully adaptable to a wide range of specimens
- Repeatable film thickness depositions
- Easy loading and unloading of samples such as 8” wafers
- Allows sequential of two different metals to be made without breaking vacuum
Note:Target thickness
Most targets used are precious metals and usually they are only 0.1 or 0.2mm thick. From April 2007 the K575x and K675x target assemblies have been changed. If targets, like Al or Cr, thicker than 0.3mm are to be used with the new systems, appropriate spacers will be necessary under the dark space shield. Typically, a 1.5mm target will require a spacer ring (Part number A4117193).
Specification of K675X Sputtering Coater System:
- Instrument Case - 450mm W x 500mm D x 300mm H (Overall height of unit 630mm)
- Work Chamber - Borosilicate Glass 300mm Dia. x 20mm H
- Safety Shield - Polycarbonate.
- Weight - 42Kg
- Targets - Three x 57mm dia. x 0.3mm thick Chromium fitted as standard. (Pre 2007 dia. was 54mm.)
- Rotating Specimen Stage - Adjustable for 6 to 8 inch Wafers, Height spacing to target 60mm
- Vacuum Gauge - Atmos. - 1 x 10-5 mbar
- Deposition - 0-450mA
- Deposition Rate - 0-15nm/minute
- Sputter Timer - 0-4 minutes
- Supply - 230 Volts 50Hz (8 Amp Max including pump) 115 Volts 60Hz (16 Amp Max including pump)
- Services - Argon - Nominal 10 psi
- Nitrogen - Nominal 10 psi (Argon may be used as common gas)
- Rotary Backing Pump- Two Stage Vacuum Pump No.3, (Approx. 4m
Optional Accessories
- EK3175 - Rotary pump - Edwards RV3-50L/M + basic oil mist filter
- EK3170 - Diaphragm pump MD1 23 L/M
- SC7640-CF - Carbon fibre attachment (includes power supply)
- SC7640-CR - Carbon rod attachment (includes power supply)
- EK4165 - Film thickness monitor (mounted in K675X console)
K675X Large sample, high resolution sputter coater, 203mm ask stock?
K675XD Large sample, high resolution sputter coater, 203mm, dual head ask stock?
K675X
PELTIER COOLED HIGH RESOLUTION SPUTTER COATER - EMITECH K575X & K575XD
Note: K575X is discontinued and replaced by KQ150T-S.
The K575X uses a 'Turbo' pump, backed by a Rotary Vacuum pump, the complete pumping sequence being under automatic control.
The vacuum can be adjusted to suit conditions for Chromium or other oxidising metals, as well as Gold targets, and has a Timer to allow for a range of sputtering times.
The Systems employs a Magnetron Target assembly, fitted with a 54mm Dia. quick change target.
The sputter head is Peltier Cooled to give high performance, fine grain coatings (no water requirements needed).
The Sputtering parameters can be pre-set including gas bleed needle valve, which has electromagnetic valve back up.
A typical sputtering cycle will take 5 minutes.
The K575XD (Dual Head), version of the above has two sputter heads. These are arranged such that for special coating applications, two sequential layers of a target material can be deposited without breaking the vacuum seal in this automatic unit. The K575X has Peltier cooling for very thick depositions normally associated with the K575XD (Dual) unit. It may be necessary to supplement with water cooling as required.
Note:Target thickness
Most targets used are precious metals and usually they are only 0.1 or 0.2mm thick. From April 2007 the K575X and K675X target assemblies have been changed. If targets, like Al or Cr, thicker than 0.3mm are to be used with the new systems, appropriate spacers will be necessary under the dark space shield. Typically, a 1.5mm target will require a spacer ring (Part number A4117193).
SPECIFICATIONS:
Optional Accessories
Optional Auto Vacuum Shutdown
Sputtered metal grain size comparisons
K575X Peltier cooled, high resolution sputter coater - discontinued AUD0.00 /ea stock?
K575XD Turbo chromium sputter coater, dual head ask stock?
Note: K575X is discontinued and replaced by KQ150T-S.
The K575X uses a 'Turbo' pump, backed by a Rotary Vacuum pump, the complete pumping sequence being under automatic control.
The vacuum can be adjusted to suit conditions for Chromium or other oxidising metals, as well as Gold targets, and has a Timer to allow for a range of sputtering times.
The Systems employs a Magnetron Target assembly, fitted with a 54mm Dia. quick change target.
The sputter head is Peltier Cooled to give high performance, fine grain coatings (no water requirements needed).
The Sputtering parameters can be pre-set including gas bleed needle valve, which has electromagnetic valve back up.
A typical sputtering cycle will take 5 minutes.
The K575XD (Dual Head), version of the above has two sputter heads. These are arranged such that for special coating applications, two sequential layers of a target material can be deposited without breaking the vacuum seal in this automatic unit. The K575X has Peltier cooling for very thick depositions normally associated with the K575XD (Dual) unit. It may be necessary to supplement with water cooling as required.
Note:Target thickness
Most targets used are precious metals and usually they are only 0.1 or 0.2mm thick. From April 2007 the K575X and K675X target assemblies have been changed. If targets, like Al or Cr, thicker than 0.3mm are to be used with the new systems, appropriate spacers will be necessary under the dark space shield. Typically, a 1.5mm target will require a spacer ring (Part number A4117193).
SPECIFICATIONS:
- Instrument Case - 450mm W x 350mm D x 175mm H
- Work Chamber - Borosilicate Glass 165mm Dia x 125mm H (Suitable for samples up to 100mm in diameter.)
- Safety Shield - Polycarbonate
- Plus Base - 110mm Dia x 115mm H
- Weight - 42Kg
- Target - 57mm Dia x 0.2mm Thick Chromium fitted as standard. (Pre 2007 dia. was 54mm.)
- Specimen Stage - 60mm Dia Rotate Stage with Tilt Facility
- Vacuum Gauge Range - Atmosphere to 1 x 10-5 mbar
- Operating Vacuum - 1 x 10-3 mbar to 1 x 10-4 mbar
- Deposition Current - 0-150mA
- Deposition Rate - 0-20nm/Minute
- Sputter Timer - 0-4 minutes
- Turbomolecular Pump - 60 litres/Second (Ultimate vacuum 1x10-8 mbar)
- Services - Argon - Nominal 10 psi
- Nitrogen- Nominal 10 psi (Argon may be used as common gas)
- Vacuum Pump - Two Stage Vacuum Pump No.3, (Approx. 4m
- Electrical Supply - 230 Volts 50Hz (6 Amp max. including Pump)
Optional Accessories
- EK3175 - Rotary pump - Edwards RV3-50L/M + basic oil mist filer
- EK3170 - Diaphragm pump MD1 23 L/M
- AL117145-2 - Rotate/Oscillate sample stage (K575XD only)
- EK4195 - Rotate/Oscillate sample stage (K575X only)
- A4001301 - Short stage
- EK4225 - Vacuum shutdown (allows K575X to remain under vacuum when not in use)
- EK4181 - Full range vacuum gauge (with independent display)
- SC7640-CF - Carbon fibre attachment (includes power supply)
- SC7640-CR - Carbon rod attachment (includes power supply
- EK4165 - Film thickness monitor (mounted in K575X console)
Optional Auto Vacuum Shutdown
Sputtered metal grain size comparisons
K575X Peltier cooled, high resolution sputter coater - discontinued AUD0.00 /ea stock?
K575XD Turbo chromium sputter coater, dual head ask stock?
K575X
LARGE SAMPLE SPUTTER COATER - EMITECH K650X & K650XT
The K650X is a digitally controlled large chamber sputter coater, ideally suited for SEM and other metal coating application.
There are three magnetron target assemblies in the K650X, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profiled targets.
This triple sputter target system is particularly useful in the Semiconductor Wafer Industry.
The magnetron target assemblies employed on this system enhance the efficiency of the process using low voltages, and giving a fine grain, cool sputtering, without the need to cool the target or the specimen stage. The three magnetron target assemblies in the K650X, which together with a rotating sample table enables even deposition over a large diameter of 200mm or 8 inches.
The Instrument is fitted with three 60mm diameter and 0.1mm thick gold (or Customer choice) quick change targets, giving optimum consumable cost performance. The integrated instrument panel and plug-in electronics, maximise 'up-time' and, with user friendly designs, ensure satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up which, together with automatic control, gives defined and repeatable film thickness depositions. The sputtering head is interlocked, and the system can easily accommodate the K250 Carbon Coating Attachment. The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
K650XT Turbo Unit is as detailed above but has turbo pumping at 60L/Second for a higher & cleaner vacuum.
Features:
Advantages:
Specifications:
Optional Accessories
K650X Large sample sputter coater, 225mm chamber ask stock?
K650XT Turbo large sample sputter coater, 225mm chamber ask stock?
The K650X is a digitally controlled large chamber sputter coater, ideally suited for SEM and other metal coating application.
There are three magnetron target assemblies in the K650X, positioned to give coating over a large diameter which, together with a rotating sample table, ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profiled targets.
This triple sputter target system is particularly useful in the Semiconductor Wafer Industry.
The magnetron target assemblies employed on this system enhance the efficiency of the process using low voltages, and giving a fine grain, cool sputtering, without the need to cool the target or the specimen stage. The three magnetron target assemblies in the K650X, which together with a rotating sample table enables even deposition over a large diameter of 200mm or 8 inches.
The Instrument is fitted with three 60mm diameter and 0.1mm thick gold (or Customer choice) quick change targets, giving optimum consumable cost performance. The integrated instrument panel and plug-in electronics, maximise 'up-time' and, with user friendly designs, ensure satisfactory multi-user discipline.
The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up which, together with automatic control, gives defined and repeatable film thickness depositions. The sputtering head is interlocked, and the system can easily accommodate the K250 Carbon Coating Attachment. The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
K650XT Turbo Unit is as detailed above but has turbo pumping at 60L/Second for a higher & cleaner vacuum.
Features:
- Triple target sputtering system
- Fully Automatic Control
- Low Voltage Sputtering
- High Resolution Fine Coating (Order of 2nm Gold Grain)
- Special Rotating Stage with full Tilt Facility fitted as standard
- Even Thickness Deposition (Typically 20nm or 200 Angstroms for SEM work)
- 225mm Diameter (8.5 inches) Chamber
- Can be integrated with Film Thickness Monitor
Advantages:
- Ideal for large samples such as silicon wafers
- Easy to operate
- No cooling required
- Precise Reproducible Coatings
- Fully adaptable to a wide range of specimens
- Repeatable film thickness depositions.
- Easy loading and unloading of large samples – up to 6” wafers
- Can pre-set deposition thickness
Specifications:
- Instrument Case - 450mm W x 350mm D x 175mm H
- Work Chamber - Borosilicate Glass 225mm Dia x 125mm H
- plus base - 110mm Dia x 115mm H
- Safety Shield - Polycarbonate
- Weight - 24Kg
- Target - Three x 60mm Dia x 0.1mm Thick.
- Rotating - 155mm Dia. Adjustable
- Specimen Stage - Height spacing to target 40 to 50mm
- Vacuum Gauge Range - ATM - 1x10-2 mbar
- Deposition Range - 0-100mA
- Deposition Rate - 0-20nm/Minute
- Sputter Timer - 0-4 minutes
- Services - Argon - Nominal 4 psi
- Vacuum Pump - Pump No. 5 Two Stage (Approx. 6m3
- Electrical Supply - 230 Volts 50Hz (8 amp Max. Including Pump)
Optional Accessories
- EK3175 - Rotary pump - Edwards RV350L/M + basic oil mist filter (for K650X)
- EK3171 - XDS5 Scroll pump (for K650T)
- EK3172 - XDS10 Scroll pump (for K650X)
- SC7640-CF - Carbon fibre attachment (includes power supply)
- SC7640-CR - Carbon rod attachment (includes power supply)
- EK3115 - K150X Film thickness monitor (free standing)
- EK4170 - Film thickness monitor module
K650X Large sample sputter coater, 225mm chamber ask stock?
K650XT Turbo large sample sputter coater, 225mm chamber ask stock?
K650X
CARBON EVAPORATION
The use of carbon films on TEM specimen grids or as carbon coatings is common in electron microscopy. These films add little to the background signal and they have relatively good electrical conductivity. Thin films (5 nanometres) are used in TEM to stabilise some specimens. Thicker films (up to 30 nanometres) may be used for TEM support films and in SEM for X-Ray microanalysis. Commonly, a high vacuum evaporator with carbon rods is used to produce these coatings and this system is preferred for some applications. The use of carbon fibre, has allowed a flash evaporation technique, which is suitable for many general EM requirements. Quorum manufactures a range of evaporators to meet all needs. Carbon coatings produced in high vacuum have a finer grain and these are preferred for some TEM applications; flash evaporated carbon is used for conventional SEM and EDS /WDS. Carbon fibre must be used in the low vacuum, rotary vane pump only. For high vacuum system carbon/graphite rods are preferable.
The use of carbon films on TEM specimen grids or as carbon coatings is common in electron microscopy. These films add little to the background signal and they have relatively good electrical conductivity. Thin films (5 nanometres) are used in TEM to stabilise some specimens. Thicker films (up to 30 nanometres) may be used for TEM support films and in SEM for X-Ray microanalysis. Commonly, a high vacuum evaporator with carbon rods is used to produce these coatings and this system is preferred for some applications. The use of carbon fibre, has allowed a flash evaporation technique, which is suitable for many general EM requirements. Quorum manufactures a range of evaporators to meet all needs. Carbon coatings produced in high vacuum have a finer grain and these are preferred for some TEM applications; flash evaporated carbon is used for conventional SEM and EDS /WDS. Carbon fibre must be used in the low vacuum, rotary vane pump only. For high vacuum system carbon/graphite rods are preferable.
TURBO PUMPED, HIGH RESOLUTION SPUTTER COATER/ CARBON EVAPORATOR
KQ150T is a compact turbomolecular-pumped coating system suitable for SEM, TEM and many thin film applications. This product replaces previous models K575X and K950X.
For a turbo coater with two sputtering heads (for sequential coating of two metals without breaking vacuum), see the K575XD on this page.
KQ150T is available in three formats:
KQ150T-S - high resolution sputter coater, suitable for oxidising and non-oxidising metals
KQ150T-E - high vacuum carbon coater for SEM and TEM applications
KQ150T-ES - high resolution sputter and high vacuum carbon coater
Features
More information & technical specifications
KQ150T-S Sputter coater, high resolution, turbo pumped ask stock?
KQ150T-E Carbon evaporator, high vacuum, turbo pumped ask stock?
KQ150T-ES Combination sputter coater & carbon evaporator, turbo pumped ask stock?
KQ150T is a compact turbomolecular-pumped coating system suitable for SEM, TEM and many thin film applications. This product replaces previous models K575X and K950X.
For a turbo coater with two sputtering heads (for sequential coating of two metals without breaking vacuum), see the K575XD on this page.
KQ150T is available in three formats:
KQ150T-S - high resolution sputter coater, suitable for oxidising and non-oxidising metals
KQ150T-E - high vacuum carbon coater for SEM and TEM applications
KQ150T-ES - high resolution sputter and high vacuum carbon coater
Features
- Metal sputtering or carbon evaporation, or both - can be combined in one space-saving design
- Fine grain sputtering for advanced high resolution FE-SEM applications
- High vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising metals - suitable for SEM, high resolution FE-SEM and also for many thin film applications
- High vacuum carbon coating - ideal for SEM and TEM carbon coating applications
- Advanced 'anti-stick' carbon rod evaporation gun - simple operation, reproducible results
- Control of evaporation current profile - ensures consistently reproducible carbon films
- Precise thickness control using the film thickness monitor option
- Fully automatic touch screen control - rapid data input, simple operation
- Multiple, customer-defined coating schedules can be stored - ideal for multi-user laboratories
- Automatic vacuum control which can be pre-programmed to suit the process and material - no needle valve to adjust
- 'Intelligent' recognition of system - automatically detects the type of coating insert fitted
- Easy-to-change, drop-in style specimen stages (rotation stage as standard)
- Vacuum shut-down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance
- Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum (rest periods automatically built in)
- Ergonomic one-piece moulded case - easy maintenance and service access
- Ethernet with local FTP server connection - simple programmer updates
- Power factor correction - complies with the current legislation (CE Certification) - efficient use of power means reduced running costs
- Three-year warranty
KQ150T-S Sputter coater, high resolution, turbo pumped ask stock?
KQ150T-E Carbon evaporator, high vacuum, turbo pumped ask stock?
KQ150T-ES Combination sputter coater & carbon evaporator, turbo pumped ask stock?
KQ150T
HIGH VACUUM EVAPORATOR for Multiple Applications - EMITECH K975X
The K975X Turbo Evaporator, is a multiple application system to enable a range of preparation techniques to be applied with the flexibility and module expansion capability to develop new methods and prepare new specimens.
It allows for Carbon Evaporation, Metal Evaporation from both Baskets and Crucibles and a Sputter Coating option.
A range of techniques can be practiced including carbon support films and replicas for TEM, Carbon/Metal Evaporation, Low Angle Shadowing and sequential layer coatings using dual source evaporation and the Sputter Coating option can be used for a range of target materials.
The system flexibility is further enhanced by the use of a microcontroller, which readily allows the Customer access to a range of options, but readily 'defaults' to optimum operating conditions, allowing both fully automatic and manual override as required.
The unique Loading Rack out Drawer sample system gives the user easy sample access with good sample size and the hinged lid assembly makes any other areas of the system readily accessible.
The unit has a Turbo Pump, externally mounted for convenience and easy exchange, and is backed up by a Rotary Vacuum Pump. The complete pumping sequence is under fully automatic control, achieving a high vacuum for evaporation.
The Unit is bench mounted, with easy to use controls, and cannot be damaged by inadvertent use.
Note: The K975s is based on the K975X, however it has a special load lock door which allows the entry of 8" wafer for carbon coating, with applications such as FIB work.
Features:
- Automatic pumping sequence
- Samples up to 140mm square or 200mm diameter
- Unique 'anti-stick' carbon rod gun evaporation assembly
- Rack out drawer sample loading system
- Selectable evaporation supplies giving x 4 evaporation settings
- Restricted or full vent control
- Sputter coating (option) for range of metal targets, including Cr & Pt
- Film thickness monitor (option)
Advantages:
- Ease of operation
- Flexible usage
- Reliable carbon evaporation
- Convenient sample loading/unloading
- Flexible operation – carbon and metal evaporation sources
- Prevents disturbance of samples
- Fully flexible system
- Easy to measure level of metal or carbon deposition
Specifications of the K975X High Vacuum Evaporator:
- Instrument Case - W :450mm x D500 x H:300mm
- Borosilicate Glass Work Chamber with Hinged Top Plate - Dia: 250mm x H: 300mm (can accommodate samples to 200 mm) (8") in Dia.
- Safety Polycarbonate Implosion Guard - To suit work chamber readily removable for maintenance
- Weight - 65Kg.
- Carbon Gun - Adjustable height with Tilt Control 0-20o. Uses 6.15mm Carbon Rods
- Turbomolecular Pump - 100L/Seconds as Standard Optional Sizes Available
- Vacuum Gauges - Active Gauge Head (incl. Penning gauge) Atm to 1x10-7 mbar.
- Working Vacuum - within 15 minutes
- Operating Vacuum - Into x10-5 mbar range (Liquid Nitrogen Trap Option Available)
- Evaporation Supply (Pulsed or Variable Control) - 4 x Selectable, Low Voltage Volts a.c. V, 5V, 15V,25V @ 25 amps. 7V @100 amps
- Specimen Table - With Tilt Facility 0-45o
- Rotating Specimen Table Option - 60mm Dia.Tilting 0-45o, with Variable Speed Control 15rpm To 45rpm
- Sputtering Option
- Deposition - 0 - 100mA
- Deposition Rate - 0-50nm/Minute Gold (Au)
- Standard Target - 57 mm Au (options Pt, Pt/Pd, Pd, Cr, Ni, Cu, Ag)
- Timer - 0 to 4 Minutes
- HT Safety Interlocked
Use of optional sputter module
The sputter module has to be installed by the factory, it is permanently wired into the system. The exchange between sputtering and evaporation is easy – remove the evaporation source or sputter target from the appropriate terminal and replace it with the required source. To avoid contamination of the sputter source with carbon, remove the sputter target from the chamber if only one evaporation is needed. For sequential evaporation and sputtering it is best to install a shutter in order to protect the target during evaporation. (Shutter Assembly - AL410123).
Film Thickness Option
Glow Discharge Option
Services - Argon (For Sputtering option) Nominal 4 psi
- Vacuum Pump (Recommended) - E2M5 complete with vacuum hose and oil mist filter 4m3/h
- Electrical supply - 230 Volts - 50/60Hz - 8 amp normal including pump. In pulse mode a minimum of 16 amp is required.
Optional Accessories:
- EK3175 - Rotary pump - Edwards RV3 - 50L/M + basic oil mist filter
- EK3170 - Diaphragm pump MD1 23 L/M
- EK4160 - Low angled shadowing
- EK4205 - Rotary stage planetary (with externally adjustable tilt)
- EK4175 - Sputtering module
- EK4165 - Film thickness monitor (mounted in K975X console)
- EK3172 - XDS10 Scroll pump
K975X High vacuum evaporator for multiple applications - ask
K975X
Sputter head
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