Quorum/EMITECH's range of sputter coaters includes the K695X
. The K695X is able to coat single 12" wafers in one operation, and with its unique sputtering arm can sputter two different target materials sequentially.
These units are all benchtop units utilising magnetron target assemblies. The magnetron target assembly enhances the efficiency of the process using low voltages and results in fine grain and cool sputtering.
All units are designed with an integrated panel and plug-in electronics to maximise up-time. All systems are engineered for easy operation and they are well suited for multi-user environments. The independent rotary pumps are controlled by the instruments throughout the process.
The triple-target system is particularly useful in the semi-conductor wafer industry. It has a turbomolecular pump backed by a rotary vacuum pump. The integrated instrument panel and plug-in electronics maximise 'up-time' and, with user friendly designs, ensures satisfactory multi-user discipline. The sputtering parameters can be pre-set, including the gas bleed needle valve which has electromagnetic valve back-up.
The independent vacuum pump is controlled by the instrument throughout the fully automatic coating cycle.
It can be used to sputter coat targets such as gold, and also targets that may need pre-cleaning, or the removal of oxide layers such as chromium. A shutter assembly is fitted as standard which allows a sputter cleaning and the sputter cycle to be carried out while maintaining the vacuum.Notes on Sputter Coating
When a glow discharge is formed between a Cathode and Anode using a suitable gas (typically Argon), and Cathode target material (commonly Gold) the bombardment of the target with gas ions will erode this target material, this process being termed "Sputtering".
The resulting omni-directional deposition of sputtered atoms will form an even coating on the surface of the specimen, normally located on the stage (anode) of the instrument. This electrically conductive thin coating will be representative of the surface of the specimen. It will inhibit charging, reduce thermal damage, and improve secondary electron emission which are beneficial for Scanning Electron Microscopy.
How to mount targets in a sputter coater
Most targets are held by a cover or crimped around the edge - if yours is not that type it must be glued.
'Glue' used must be electrically conducting.
For 'professional' mounting use a few slivers of indium wire on the support plate, cover with the target and then either place in an oven with a flat weight on top of the target or use a smoothing iron to heat the gold and hence melt the indium. Placing something like a piece of lens tissue onto the target would protect it.
For a short time a temperature a little higher than melting point of Indium is required; m.p. 156.6°C.
Alternatively use a bit of silver conducting paint, best find a few small drops of paste at the bottom of the jar.
You could also make a paste using our silver powder and a little commercial epoxy glue - method under Silver powder C920 on page C8
. Only spot gluing is required, but keep a weight on the target while drying/ curing.
All models have full digital equipment control, with easy to read LCD display and menu driven operation